Key Four Target RF-DC Sputtering System

  • August 3rd, 2010
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The Key System is a 4 Target RF/DC High Vacuum sputtering tool. It utilizes 4 2” guns that can sputter both metals and insulators in an Argon atmosphere. The base pressure after bakeout is 5 x 10-8 Torr. The carousel can hold up to 12 samples for consecutive deposition.

Current location: Bevill 1064